Topological and model based approach to pitch decomposition for double patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6792, Issue , 2008, Pages

  Nikolsky, Peter ^a   Davydova, Natalia ^a   Goossens, Ronald ^a  

^a ASML   (Netherlands)

Author keywords

Design for manufacturing; DfM; Double patterning technology; DPT; Model based splitting; Split check

Indexed keywords

(E ,3E) PROCESS; DECOMPOSITION ALGORITHMS; DESIGN-FOR-MANUFACTURABILITY (DFM); DOUBLE PATTERNING; ENABLING TECHNOLOGIES; EUROPEAN; FALSE ALARMS (FA); FEED BACK LOOPS; GENERIC DESIGNS; LITHO PROCESS; MASK DATA PREPARATION (MDP); MODEL BASED (OPC); MODEL BASED APPROACHES; RESOLUTION LIMITS; RULE-BASED; SUB RESOLUTION; TECHNOLOGY NODES; TOPOLOGICAL APPROACH; TOPOLOGICAL RULES;

EID: 44949233070     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.798518     Document Type: Conference Paper

References (7)

1. M.A. van den Brink, "Challenges and Opportunities to Keep Lithography Scaling on Track", SPIE Vol. 6349-01, to be published, 2006.
2. Jungchul Park et al., "Application Challenges with Double Patterning Technology (DPT) beyond 45 nm", Proc. of SPIE Vol. 6349, 634922, (2006).
3. 1eff <0.20", Proc. of SPIE Vol. 6349, 634910, (2006).
4. Anton van Oosten, Peter Nikolsky et al, "Pattern Split Rules! A Feasibility Study of Rule Based Pitch Decomposition for Double Patterning", Proc. of SPIE (2007)
5. Harary, Frank, Graph Theory (1969), Addison-Wesley, Reading, MA.
6. Alan Gibbons. Algorithmic Graph Theory. Cambridge Univ. Press 1985/1993
7. Asratian, A.S., Denley, T.M.J, and Häggkviist, R., Bipartite Graphs and their Applications. 1998. Cambridge University Press, Cambridge.