Using scatterometry to improve process control during the spacer pitch splitting process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7140, Issue , 2008, Pages

  Corboy, Scott ^a   MacNaughton, Craig ^a   Gubiotti, Thomas ^a   Wollenweber, Marcus ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

Complex structures; Metrology; Scatterometry; Spacer pitch splitting

Indexed keywords

32NM NODES; ACCURATE MEASUREMENTS; COMPLEX STRUCTURES; CRITICAL DIMENSIONS; FILM LAYERS; GATE PATTERNING; GATE PATTERNS; IN LINES; LEADING EDGES; LITHOGRAPHY CONDITIONS; LITHOGRAPHY RESOLUTIONS; METROLOGY; MOORE'S LAWS; NOVEL METHODS; ONE DIMENSIONS; PATTERN TRANSFERS; SCATTEROMETRY; SEMICONDUCTOR MANUFACTURING; SPACER PITCH SPLITTING; SPLITTING PROCESS; SUB RESOLUTIONS;

LAWS AND LEGISLATION; PHOTORESISTS; SEMICONDUCTING INDIUM;

LITHOGRAPHY;

EID: 62449275799     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.804578     Document Type: Conference Paper

References (2)

1. Wack, D., Hench, J., Poslavsky, L., Fielden, F., Zhuang, V., Mieher, W., Dziura, T.. "Opportunities and Challenges for Optical CD Metrology in Double Patterning Process Control", Proc SPIE Vol. 6922, 69221N
2. Sendelbach, M., Zangooie, S., Vaid, Alok., Herrera, Pedro., Leng, Jingmin., Kim, InKyo, "Assessing scatterometry for measuring advanced spacer structures with embedded SiGe", Proc SPIE Vol. 6922, 69220R