High-throughput study of the anodic oxidation of Hf-Ti thin films

Electrochimica Acta

Volumn 54, Issue 22, 2009, Pages 5171-5178

  Mardare, Andrei Ionut ^a   Ludwig, Alfred ^b   Savan, Alan ^b   Wieck, Andreas Dirk ^b   Hassel, Achim Walter ^a  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Anodic oxide film; Combinatorial libraries; High throughput experimentation; Scanning droplet cell

Indexed keywords

ANODIC OXIDE FILM; ANODIC OXIDES; AUTOMATIC SCANNING; COMBINATORIAL LIBRARIES; COMBINATORIAL THIN FILMS; COMPREHENSIVE STUDIES; COSPUTTERING; DIELECTRIC CONSTANTS; DONOR DENSITY; ELECTROCHEMICAL INVESTIGATIONS; FILM FORMATIONS; FLAT BAND POTENTIAL; HIGH-THROUGHPUT; HIGH-THROUGHPUT EXPERIMENTATION; IMPEDANCE MEASUREMENT; MOTT-SCHOTTKY ANALYSIS; OXIDE PROPERTIES; PARENT METAL; POTENTIODYNAMIC SCANS; QUANTITATIVE DETERMINATIONS; SCANNING DROPLET CELL; STRUCTURE PROPERTY; TI ALLOYS; TI THIN FILMS; XRD;

ANODIC OXIDATION; DROP FORMATION; HAFNIUM; LIBRARIES; SCANNING; THIN FILMS; TITANIUM ALLOYS;

OXIDE FILMS;

EID: 65749088313     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.01.016     Document Type: Article

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