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Volumn 414, Issue 2, 2002, Pages 296-303

Breakdown of ultrathin anodic valve metal oxide films in metal-insulator-metal-contacts compared with metal-insulator-electrolyte contacts

(2) Hassel, Achim W a Diesing, Detlef b

a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH (Germany)

b HEINRICH HEINE UNIVERSITY (Germany)

Author keywords

Aluminium; Aluminium oxide; Anodic oxidation; Breakdown; Electrochemistry; Hafnium; Niobium; Tantalum; Titanium; Tunnelling; Zirconium

Indexed keywords

ANODIC OXIDATION; COMPUTER SIMULATION; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC CONTACTS; ELECTROLYTES; ELECTRON TUNNELING; MIM DEVICES; PHYSICAL VAPOR DEPOSITION;

TUNNEL CURRENTS;

ULTRATHIN FILMS;

EID: 0037158419 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00453-4 Document Type: Article

Times cited : (56)

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