Characterization of nanocrystalline TiO2-HfO2 thin films prepared by low pressure hot target reactive magnetron sputtering

Surface and Coatings Technology

Volumn 200, Issue 22-23 SPEC. ISS., 2006, Pages 6283-6287

  Domaradzki, J ^a   Kaczmarek, D ^a   Prociow, E L ^a   Borkowska, A ^a   Kudrawiec, R ^b   Misiewicz, J ^b   Schmeisser, D ^c   Beuckert, G ^c  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b Inst Microlectron Optoelectronics   (Poland)

^c BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Hafnium; Hot target; Magnetron sputtering; Multicomponent oxide; Thin film; Titanium

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; HAFNIUM; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; OXIDES; STOICHIOMETRY; TITANIUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

MULTICOMPONENT OXIDE; OPTICAL ABSORPTION SPECTRA; PLASMA DISCHARGE; PSEUDOEPITAXIAL CONDITIONS; REACTIVE OXYGEN PLASMA;

THIN FILMS;

ANNEALING; ATOMIC FORCE MICROSCOPY; HAFNIUM; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; OXIDES; STOICHIOMETRY; THIN FILMS; TITANIUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33646138240     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.11.055     Document Type: Article

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