Microelectrochemical lithography: A method for direct writing of surface oxides

Electrochimica Acta

Volumn 52, Issue 28, 2007, Pages 7865-7869

  Mardare, Andrei Ionut ^a   Wieck, Andreas Dirk ^b   Hassel, Achim Walter ^a  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Anodic oxide film; Electrochemical lithography; Scanning droplet cell; Titanium thin film

Indexed keywords

ELECTRIC POTENTIAL; FILM THICKNESS; POTENTIODYNAMIC POLARIZATION; SYSTEMATIC ERRORS; THIN FILMS;

ANODIC OXIDE FILM; DIRECT WRITING; SPOT WRITING; SURFACE OXIDES; TITANIUM THIN FILM;

LITHOGRAPHY;

EID: 34548127970     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2007.06.048     Document Type: Article

References (22)

1. von Gutfeld R.J. J. Opt. Soc. Am. B 4 (1987) 272
2. Bade K., Karstens O., Michaelis A., and Schultze J.W. Faraday Discuss. 94 (1992) 45
3. Schweinsberg M., Kudelka S., Michaelis A., and Schultze J.W. Mater. Corros. 49 (1998) 161
4. Hassel A.W., and Lohrengel M.M. Electrochim. Acta 42 (1997) 3327
5. Hassel A.W., Fushimi K., and Seo M. Electrochem. Comm. 1 (1999) 180
6. Lill K.A., and Hassel A.W. J. Solid State Electrochem. 10 (2006) 941
7. Hassel A.W., and Seo M. Electrochim. Acta 44 (1999) 3769
8. Schreiber A., Schultze J.W., Lohrengel M.M., Kármán F., and Kálmán E. Electrochim. Acta 51 (2006) 2625
9. Lill K.A., Hassel A.W., Frommeyer G., and Stratmann M. Electrochim. Acta 51 (2005) 978
10. A.W. Hassel, K. Fushimi, T. Okawa, M. Seo, Local analysis of anodic oxide films on titanium by scanning droplet cell and scanning electrochemical microscope, in: A.C. Hillier, M. Seo, S.R. Taylor (Eds.), Localized In Situ Methods for Investigating Electrochemical Interfaces, Electrochem. Soc. Proc. PV 99-28 (1999) 166.
11. Stern M., and Wissenberg H. J. Electrochem. Soc. 106 (1959) 755
12. Armstrong N.R., and Quinn P.K. Surf. Sci. 67 (1977) 451
13. Pesant J.C., and Vennereau P. J. Electroanal. Chem. 106 (1980) 103
14. Schultze J.W., Stimming U., and Weise J. Ber. Bunsenges. Phys. Chem. 86 (1982) 276
15. Ohtsuka T., and Nomura N. Corros. Sci. 39 (1997) 1253
16. Ohtsuka T., and Otsuki T. Corros. Sci. 40 (1998) 951
17. Diesing D., Hassel A.W., and Lohrengel M.M. Thin Solid Films 342 (1999) 282
18. Hassel A.W., and Diesing D. Thin Solid Films 414 (2002) 296
19. Hassel A.W., and Diesing D. Electrochem. Comm. 4 (2002) 1
20. Lohrengel M.M. Mater. Sci. Eng. R11 (1993) 243
21. A.W. Hassel, Diploma thesis, Heinrich-Heine-Universität Düsseldorf, Germany, 1993.
22. Lohrengel M.M., Moehring A., and Pilaski M. Electrochim. Acta 47 (2001) 137