A combinatorial passivation study of Ta-Ti alloys

Corrosion Science

Volumn 51, Issue 7, 2009, Pages 1519-1527

  Mardare, Andrei Ionut ^a,b   Savan, Alan ^b   Ludwig, Alfred ^b   Wieck, Andreas Dirk ^b   Hassel, Achim Walter ^a  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

A. Tantalum, titanium; B. Combinatorial electrochemistry, scanning droplet cell; C. Anodic films

Indexed keywords

A. TANTALUM, TITANIUM; ANODIC OXIDES; AUTOMATED SCANNING; B. COMBINATORIAL ELECTROCHEMISTRY, SCANNING DROPLET CELL; C. ANODIC FILMS; COMBINATORIAL STUDIES; COMPOSITION SPREAD; DIELECTRIC CONSTANTS; DONOR DENSITY; FILM FORMATIONS; FLAT BAND POTENTIAL; GRAZING ANGLE X-RAY DIFFRACTION; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; HIGH-THROUGHPUT; PARENT METAL; TI ALLOYS;

CERIUM ALLOYS; CYCLIC VOLTAMMETRY; DROP FORMATION; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROCHEMISTRY; HIGH RESOLUTION ELECTRON MICROSCOPY; METALLIC FILMS; PASSIVATION; SCANNING; SCANNING ELECTRON MICROSCOPY; TANTALUM; TITANIUM;

TITANIUM ALLOYS;

EID: 67349114938     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2008.12.003     Document Type: Article

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