Low-loss lateral micromachined switches for high frequency applications

Journal of Micromechanics and Microengineering

Volumn 15, Issue 1, 2005, Pages 157-167

  Liu, A Q ^a   Tang, M ^a   Agarwal, A ^b   Alphones, A ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DEEP REACTIVE ION ETCHING (DRIE); HIGH FREQUENCY STRUCTURE SIMULATORS (HFSS); QUASI-FINITE GROUND COPLANAR WAVEGUIDES (FGCPW); SHADOW MASK TECHNOLOGY;

CANTILEVER BEAMS; COMPUTER SIMULATION; ELECTROSTATICS; FINITE ELEMENT METHOD; INSERTION LOSSES; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; OPTIMIZATION; PHASE SHIFTERS; REACTIVE ION ETCHING; SILICON ON INSULATOR TECHNOLOGY; THRESHOLD VOLTAGE; WAVEGUIDES;

SWITCHES;

EID: 12344256731     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/1/023     Document Type: Article

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