메뉴 건너뛰기




Volumn 45, Issue 5, 2009, Pages 2304-2307

Fabrication of metallic nano stamp to replicate patterned substrate using electron-beam recording, nanoimprinting, and electroforming

Author keywords

Electron beam recording (EBR); Fluoroctatrichlorosilane; Metallic nano stamp; Nanoelectroforming; Nanoimprinting; Sulfamate solution

Indexed keywords

COST EFFECTIVENESS; ELECTRON BEAMS; INDUCTIVELY COUPLED PLASMA; MOLDS; NANOIMPRINT LITHOGRAPHY; NICKEL; OPTICAL DISK STORAGE; POLYMERS; SELF ASSEMBLED MONOLAYERS; SUBSTRATES;

EID: 65349192203     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2009.2016476     Document Type: Article
Times cited : (19)

References (14)
  • 1
    • 0032115760 scopus 로고    scopus 로고
    • Signal to noise ratio scaling and density limit estimate in longitudinal magnetic recording
    • H. N. Bertram, H. Zhou, and R. Gustafson, "Signal to noise ratio scaling and density limit estimate in longitudinal magnetic recording," IEEE Trans. Magn., vol. 34, pp. 1845-1847, 1998.
    • (1998) IEEE Trans. Magn , vol.34 , pp. 1845-1847
    • Bertram, H.N.1    Zhou, H.2    Gustafson, R.3
  • 2
    • 0142058275 scopus 로고    scopus 로고
    • C. R. K. Marrian and D. M. Tennant, Nanofabrication, J. Vac. Sci. Technol. A, 21, pp. S207-S215, 2003.
    • C. R. K. Marrian and D. M. Tennant, "Nanofabrication," J. Vac. Sci. Technol. A, vol. 21, pp. S207-S215, 2003.
  • 3
    • 0001572980 scopus 로고    scopus 로고
    • Writing and reading perpendicular magnetic recording media patterned by a focused ion beam
    • J. Lohau, A. Moser, C. T. Rettner,M. E. Best, and B. D. Terris, "Writing and reading perpendicular magnetic recording media patterned by a focused ion beam," Appl. Phys. Lett., vol. 78, pp. 990-992, 2003.
    • (2003) Appl. Phys. Lett , vol.78 , pp. 990-992
    • Lohau, J.1    Moser, A.2    Rettner, C.T.3    Best, M.E.4    Terris, B.D.5
  • 7
    • 0030570065 scopus 로고    scopus 로고
    • Imprint lithography with 25-nanometer resolution
    • S. Y. Chou, P. R. Krauss, and P. J. Renstrom, "Imprint lithography with 25-nanometer resolution," Science, vol. 272, pp. 85-87, 1996.
    • (1996) Science , vol.272 , pp. 85-87
    • Chou, S.Y.1    Krauss, P.R.2    Renstrom, P.J.3
  • 8
    • 32944482182 scopus 로고    scopus 로고
    • Self-assembled monolyaer as an antiadhesion layer on a nickel nanostamper in the nanoreplication process for optoelectronic applications
    • N. Lee, S. Choi, and S. Kang, "Self-assembled monolyaer as an antiadhesion layer on a nickel nanostamper in the nanoreplication process for optoelectronic applications," Appl. Phys. Lett., vol. 88, p. 073101, 2006.
    • (2006) Appl. Phys. Lett , vol.88 , pp. 073101
    • Lee, N.1    Choi, S.2    Kang, S.3
  • 10
    • 38549105135 scopus 로고    scopus 로고
    • Realization of silicon nitride template for nanoimprint
    • Z. Liu, T. Zhang, L. Liu, and Z. Li, "Realization of silicon nitride template for nanoimprint," Solid State Phenom., vol. 121-123, pp. 669-672, 2007.
    • (2007) Solid State Phenom , vol.121-123 , pp. 669-672
    • Liu, Z.1    Zhang, T.2    Liu, L.3    Li, Z.4
  • 11
    • 34247486574 scopus 로고    scopus 로고
    • Diamond-like-carbon (DLC) master creation for use in soft lithography using the atomic force microscope (AFM)
    • G. S. Watson, S. Myhra, and J. A. Watson, "Diamond-like-carbon (DLC) master creation for use in soft lithography using the atomic force microscope (AFM)," J. Phys.: Conf. Ser., vol. 61, pp. 1246-1250, 2007.
    • (2007) J. Phys.: Conf. Ser , vol.61 , pp. 1246-1250
    • Watson, G.S.1    Myhra, S.2    Watson, J.A.3
  • 12
    • 0034428091 scopus 로고    scopus 로고
    • Preparation of diamond mold using electron beam lithography for application to nanoimprint lithography
    • J. Taniguchi, Y. Tokano, and I. Miyamoto, "Preparation of diamond mold using electron beam lithography for application to nanoimprint lithography," Jpn. J. Appl. Phys., vol. 39, pp. 7070-7074, 2000.
    • (2000) Jpn. J. Appl. Phys , vol.39 , pp. 7070-7074
    • Taniguchi, J.1    Tokano, Y.2    Miyamoto, I.3
  • 13
    • 79956012977 scopus 로고    scopus 로고
    • Nanoscale patterning of magnetic islands of imprint lithography using a flexible mold
    • G. M. McClelland, M. W. Hart, C. T. Rettner,M. E. Best, K. R. Cartner, and B. D. Terris, "Nanoscale patterning of magnetic islands of imprint lithography using a flexible mold," Appl. Phys. Lett., vol. 81, pp. 1483-1485, 2002.
    • (2002) Appl. Phys. Lett , vol.81 , pp. 1483-1485
    • McClelland, G.M.1    Hart, M.W.2    Rettner, C.T.3    Best, M.E.4    Cartner, K.R.5    Terris, B.D.6
  • 14
    • 0036614058 scopus 로고    scopus 로고
    • Nanoimprint lithography using replicated mold by Ni electroforming
    • Y. Hirai, S. Harada, S. Isaka, M. Kobayashi, and Y. Tanaka, "Nanoimprint lithography using replicated mold by Ni electroforming," Jpn. J. Appl. Phys., vol. 41, pp. 4186-4189, 2002.
    • (2002) Jpn. J. Appl. Phys , vol.41 , pp. 4186-4189
    • Hirai, Y.1    Harada, S.2    Isaka, S.3    Kobayashi, M.4    Tanaka, Y.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.