Micron-scale patterning of hyperbranched polymer films by micro-contact printing [21]

Journal of the American Chemical Society

Volumn 121, Issue 6, 1999, Pages 1419-1420

  Lackowski, William M ^a   Ghosh, Pradyut ^a   Crooks, Richard M ^a  

^a TEXAS A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLICS; ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAFTING (CHEMICAL); LITHOGRAPHY; MONOLAYERS; STRUCTURE (COMPOSITION); SURFACES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

HYPERBRANCHED POLYMER FILM; MICRO CONTACT PRINTING; MICRON SCALE PATTERNING; OPTICAL PROFILOMETRY; POLYACRYLIC ACID; POLYTERT BUTYL ACRYLATE;

PLASTIC FILMS;

POLYMER;

ANALYTIC METHOD; CHEMICAL STRUCTURE; FILM; HYDROLYSIS; IMAGE ANALYSIS; LETTER; STRUCTURE ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0033577008     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja983545q     Document Type: Letter

References (30)

1. Bruening, M. L.; Zhou, Y.; Aguilar, G.; Agee, R.; Bergbreiter, D. E.; Crooks, R. M. Langmuir 1997, 13, 770-778.
2. Zhou, Y.; Bruening, M. L.; Bergbreiter, D. E.; Crooks, R. M.; Wells, M. J. Am. Chem. Soc. 1996, 118, 3773-3774.
3. Xia, Y.; Whitesides, G. M. Angew. Chem. 1998, 110, 568-594: Angew, Chem., Int. Ed. Engl. 1998, 37, 550-575.
4. Xia, Y.; Whitesides, G. M. Angew. Chem. 1998, 110, 568-594: Angew, Chem., Int. Ed. Engl. 1998, 37, 550-575.
5. Zhao, M.; Bruening, M. L.; Zhou, Y.; Bergbreiter, D. E.; Crooks, R. M. Isr. J. Chem. 1997, 37, 277-286.
6. Zhao, M.; Zhou, Y.; Bruening, M. L.; Bergbreiter, D. E.; Crooks, R. M. Langmuir 1997, 13, 1388-1391.
7. Wolf, S.; Tauber, R. N. Silicon Processing for the VLSI Era: Lattice: Sunset Beach, CA, 1986; Vol. 1.
8. Ghosh, P.; Amirpour, M. L.; Lackowski, W. M.; Pishko, M. V.; Crooks, R. M. Angew. Chem. Submitted for publication.
9. Jeon, N. L.; Lin, W.; Erhardt, M. K.; Girolami, G. S.; Nuzzo, R. G. Langmuir 1997, 13, 3833-3838.
10. St. John, P. M.; Davis, R.; Cady, N.; Czajka, J.; Batt, C. A.; Craighead, H. G. Anal. Chem. 1998, 70, 1108-1111.
11. Kumar, A.; Whitesides, G. M. Appl. Phys. Lett. 1993, 63, 2002-2004. We deviated slightly from the procedure for preparing the stamp described in this reference. Photoresist (AZP 4210, Clariant; Somerville, NJ) was spin-coated onto Al foil. The photoresist was exposed through the pattern mask and developed. The PDMS stamp was then cast onto the photoresist pattern.
12. Xia, Y.; Mrksich, M.; Kim, E.; Whitesides, G. M. J. Am. Chem. Soc. 1995, 117, 9576-9577.
13. Xia, Y.; Tien, J.; Qin, D.; Whitesides, G. M. Langmuir 1996, 12, 4033-4038.
14. Xia, Y.; Venkateswaran, N.; Qin, D.; Tien, J.; Whitesides, G. M. Langmuir 1998, 14, 363-371.
15. Hidber, P. C.; Nealey, P. F.; Helbig, W.; Whitesides, G. M. Langmuir 1996, 12, 5209-5215.
16. Jenkins, A. T. A.; Bushby, R. J.; Boden, N.; Evans, S. D.; Knowles, P. F.; Liu, Q.; Miles, R. E.; Ogier, S. D. Langmuir 1998, 14, 4675-4677.
17. James, C. D.; Davis, R. C.; Kam, L.; Craighead, H. G.; Isaacson, M.; Turner, J. N.; Shain, W. Langmuir 1998, 14, 741-744.
18. Martin, B. D.; Gaber, B. P.; Patterson, C. H.; Turner, D. C. Langmuir 1998, 14, 3971-3975.
19. Jackman, R. J.; Brittain, S. T.; Adams, A.; Prentiss, M. G.; Whitesides, G. M. Science 1998, 280, 2089-2091.
20. Huck, W. T. S.; Tien. J.; Whitesides, G. M. J. Am. Chem. Soc: 1998, 120, 8267-8268.
21. Böltau, M.; Walheim, S.; Mlynek, J.; Krausch, G.; Steiner, U. Nature 1998, 391, 877-879.
22. Hammond, P. T.; Whitesides, G. M. Macromolecules 1995, 28, 7569-7571.
23. Clark, S. L.; Montague, M. F.; Hammond, P. T. Macromolecules 1997, 30, 7237-7244.
24. Rozsnyai, L. F.; Wrighton, M. S. J. Am. Chem. Soc. 1994, 116, 5993-5994.
25. Rozsnyai, L. F.; Wrighton, M. S. Chem. Mater. 1996, 8, 309-311.
26. Husemann, M.; Mecerreyes, D.; Hawker, C. J.; Hendrick, J. L.; Shah, R.; Abbott, N. L. Angew. Chem. In press.
27. Zhou, Y.; Bruening, M. L.; Liu, Y.; Crooks, R. M.; Bergbreiter, D. E. Langmuir 1996, 12, 5519-5521.
28. If the sample is exposed to MUA for > 30 min exchange between the C16SH and MUA occurs leading to polymer growth on both patterned and unpatterned portions of the sample.
29. Aspnes, D. E.; Theeten, J. B.; Hottier, F. Phys. Rev. B 1979, 20, 3292-3302.
30. Peez, R. F.; Dermody, D. L.; Franchina, J. G.; Jones, S. J.; Bruening, M. L.; Bergbreiter, D. E.; Crooks, R. M. Langmuir 1998, 14, 4232-4237.