Control of plasma process instabilities during thin silicon film deposition

Thin Solid Films

Volumn 517, Issue 14, 2009, Pages 4188-4191

  Hrunski, D ^a   Grahlert W ^a   Beese, H ^a   Kilper, T ^a   Gordijn, A ^a   Appenzeller, W ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Large area deposition; PECVD; Process instabilities; Thin silicon films

Indexed keywords

DEPOSITION CHAMBERS; DEPOSITION CONDITIONS; DIAGNOSTIC ABILITIES; DIRECT MEASUREMENTS; FILM DEPOSITIONS; FOURIER TRANSFORM INFRARED ABSORPTION SPECTROSCOPIES; FTIR; FTIR MEASUREMENTS; GAS RESIDENCES; IN-SITU; IN-SITU PROCESS; LARGE-AREA DEPOSITION; PECVD; PLASMA IMPEDANCES; PLASMA PROCESS; PLASMA PROPERTIES; PROCESS CHAMBERS; PROCESS INSTABILITIES; REACTANT CONCENTRATIONS; SELF-BIAS VOLTAGES; SILANE CONCENTRATIONS; SOLAR CELL PERFORMANCE; TECHNOLOGICAL PARAMETERS; THIN SILICON FILMS; THIN-FILMS; TRANSIENT STATE;

ABSORPTION SPECTROSCOPY; AMORPHOUS FILMS; AMORPHOUS SILICON; ATOMIC SPECTROSCOPY; BIAS VOLTAGE; DEPOSITION; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS ABSORPTION; METALLIC FILMS; MOLECULAR SPECTROSCOPY; NONMETALS; OPTICAL EMISSION SPECTROSCOPY; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA STABILITY; PLASMAS; SILANES;

PROCESS CONTROL;

EID: 65149103939     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.003     Document Type: Article

References (25)

1. M.N. van den Donker, Ph.D. Thesis, Eindhoven University, The Netherlands, 2006.
2. Kilper T., van den Donker M.N., Carius R., Rech B., Bräuer G., and Repmann T. Thin Solid Films 516 (2008) 4633
3. Ashida Y., Miyachi K., Tanaka H., Koyama M., Fukuda N., and Nitta A. In: Green M.A. (Ed). Proceedings of the 4th International Photovoltaic Science and Engineering Conference, The Institution of Radio and Radio Electronics Engineers Australia, New South Wales, Australia, February 14-17 (1989) 277
4. Nguyen V.S., and Pan P.H. Appl. Phys. Lett. 45 (1984) 134
5. Nakayama Y., Ohtsuchi T., and Kawamura T. J. Appl. Phys. 162 (1987) 1022
6. Platz R., Fischer D., Dubail S., and Shah A. In: Ossenbrink H.A., et al. (Ed). 14th EU PVSEC, Barcelona, Spain, 30 June (1997) 636
7. Hrunski D., Rech B., Schmitz R., Mück A., Pinçon O., Breuer U., and Beyer W. Thin Solid Films 516 (2008) 4639
8. Nakayama Y., Ohtsuchi T., Nakano M., and Kawamura T. J. Non-Cryst. Solids 77/2 (1985) 757
9. Levenspiel O. Chemical reaction engineering (2007), Wiley-India
10. Repmann T., Appenzeller W., Roschek T., Rech B., Kluth O., Müller J., Psyk W., Geyer R., and Lechner P. In: McNelis B., Palz W., Ossenbrink H.A., and Helm P. (Eds). Proceedings of the Seventeenth European Photovoltaic Solar Energy Conference, WIP-Munich and ETA-Florence, Munich, Germany, Oct. 2001 (2002) 2836
11. Rech B., Müller J., Repmann T., Kluth O., Roschek T., Hüpkes J., Stiebig H., and Appenzeller W. In: Abelson J.R., Ganguly G., Matsumura H., Robertson J., and Schiff E. (Eds). Amorphous and Nanocrystalline Silicon-Based Films, San Francisco, California, U.S.A. Warrendale, Pa. April 22-25, 2003, Materials Research Society Symposium Proceedings 762 (2003) S. A3.1.
12. Hrunski D., Grählert W., Beese H., Gorgijn A., Stickelmann U., Kilper T., and Appenzeller W. Photovoltaics International, fourth quarter (2008) 83
13. Rech B., Roschek T., Repmann T., Muller J., Schmitz R., and Appenzeller W. Thin Solid Films 427 (2003) 157
14. Platz R., Wagner S., Hof C., Shah A., Wieder S., and Rech B. J. Appl. Phys. 84 (1998) 3949
15. Cobrun J.W., and Chen M. J. Appl. Phys. 51 (1980) 3134
16. Raizer Y. Gas Discharge Physics (1991), Springer Verlag, Heidelberg
17. Cleland T.A., and Hess D.W. J. Appl. Phys. 64/3 (1988) 1068
18. Matsuda A., Takai M., Nishimoto T., and Kondo M. Sol. Energy Mater. Sol. Cells 78 (2003) 3
19. Hollenstein Ch., Howling A.A., Courteille C., Magni D., Scholtz Odermatt S., Kroesen G.M.W., Simons N., de Zeeuw W., and Schwarzenbach W. J. Phys. D: Appl. Phys. 31 (1998) 74
20. Doyle J.R., Doughty D.A., and Gallagher A. J. Appl. Phys. 68 9 (1990) 4375
21. Kushner M.J. J. Appl. Phys. 63/8 (1988) 2532
22. Tachibana K., Nischida M., Harima H., and Urano Y. J. Phys. 17 (1984) 1727
23. van den Donker M.N., Rech B., Finger F., Houben L., Kessels W.M.M., and van de Sanden M.C.M. Prog. Photovolt.: Res. Appl. 15 (2007) 291
24. van den Donker M.N., Kilper T., Grunsky D., Rech B., Houben L., Kessels W.M.M., and van de Sanden M.C.M. Thin Solid Films 515/19 (2007) 7455
25. Raniero L., A'guas H., Pereira L., Ferreira I., Fortunato E., and Martins R. Mat. Sci. Forum 104 (2004) 455