Laser-MBE growth of high-quality ZnO thin films on Al2O3(0001) and SiO2/Si(100) using the third harmonics of a Nd:YAG laser

Applied Physics A: Materials Science and Processing

Volumn 74, Issue 4, 2002, Pages 509-512

  An, S J ^a   Park, W I ^a   Yi, G C ^a   Cho, S ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b University of Ulsan   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR BEAM EPITAXY; NEODYMIUM LASERS; PHOTOLUMINESCENCE; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICA; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

THIRD HARMONICS;

THIN FILMS;

EID: 0036534473     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390101035     Document Type: Article

References (24)