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Volumn 105, Issue 6, 2009, Pages
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Effect of thermal processing on silver thin films of varying thickness deposited on zinc oxide and indium tin oxide
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Author keywords
[No Author keywords available]
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Indexed keywords
ABRUPT CHANGES;
AFM;
AG FILMS;
ANNEALED FILMS;
ATOMIC-FORCE MICROSCOPIES;
AVERAGE SURFACE ROUGHNESS;
CRYSTALLINITY;
DEGREE OF TEXTURING;
FOUR POINT PROBES;
IN VACUUMS;
INDIUM TIN OXIDES;
INTERFACE ENERGIES;
ONSET TEMPERATURES;
OSTWALD RIPENING THEORIES;
RESISTIVITY BEHAVIORS;
RESISTIVITY CHANGES;
RUTHERFORD BACK-SCATTERING SPECTROMETRIES;
SILVER FILMS;
SILVER THIN FILMS;
THERMAL PROCESSING;
VARYING THICKNESS;
X-RAY POLE FIGURE ANALYSIS;
ZNO;
AGGLOMERATION;
ANNEALING;
ATOMIC FORCE MICROSCOPY;
CRYSTAL GROWTH;
ELECTRODEPOSITION;
INDIUM;
METAL ANALYSIS;
OSTWALD RIPENING;
OXIDE FILMS;
PHOTOLITHOGRAPHY;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
TEXTURING;
TIN;
TITANIUM COMPOUNDS;
ZINC;
ZINC OXIDE;
SILVER;
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EID: 63749124519
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.3100043 Document Type: Article |
Times cited : (22)
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References (29)
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