Study on the electrical properties of ITO films deposited by facing target sputter deposition

Journal of Physics D: Applied Physics

Volumn 42, Issue 7, 2009, Pages

  Kim, Youn J ^a   Jin, Su B ^a   Kim, Sung I ^a   Choi, Yoon S ^a   Choi, In S ^a   Han, Jeon G ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; CRYSTALLINE MATERIALS; FACINGS; INDIUM COMPOUNDS; MAGNETIC FIELDS; MAGNETRON SPUTTERING; OXIDE FILMS; TIN OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

ITO FILMS; LOW POWER; LOW SUBSTRATE TEMPERATURE; MAGNETRON SPUTTERING PROCESS; POWER DENSITIES; SUBSTRATE TEMPERATURE; TIN DOPED INDIUM OXIDE;

CARRIER CONCENTRATION;

EID: 63749110894     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/7/075412     Document Type: Article

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