Magnetron facing target sputtering system for fabricating single-crystal films

Thin Solid Films

Volumn 279, Issue 1-2, 1996, Pages 49-52

  Lin, C ^a   Sun, D C ^a,b   Liu Ming, S ^a   Jiang, E Y ^a,b   Liu, Y G ^a  

^a TIANJIN UNIVERSITY   (China)

^b TSINGHUA UNIVERSITY   (China)

Author keywords

Iron; Magnetic properties and measurements; Metals; Sputtering

Indexed keywords

COMPOSITION; FERROMAGNETIC MATERIALS; FILM PREPARATION; ION BOMBARDMENT; IRON; MAGNETIC FIELDS; MAGNETIC VARIABLES MEASUREMENT; METALLIC FILMS; METALS; PLASMA CONFINEMENT; SINGLE CRYSTALS;

COMPOSITION DEVIATION; MAGNETRON FACING TARGET SPUTTERING SYSTEM; SINGLE CRYSTAL FILMS;

MAGNETRON SPUTTERING;

EID: 0030164977     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08124-0     Document Type: Article

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