Exposure dependence of the developed depth in nonadiabatic photolithography using visible optical near fields

Journal of Nanophotonics

Volumn 1, Issue 1, 2007, Pages

  Kawazoe, Tadashi ^a   Ohtsu, Motoichi ^a   Inao, Yasuhisa ^b   Kuroda, Ryou ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b CANON INC   (Japan)

Author keywords

Nanofabrication; Optical near field; Photochemical reaction; Photolithography

Indexed keywords

NANOTECHNOLOGY; PHOTOCHEMICAL REACTIONS; PHOTOLITHOGRAPHY; PHOTORESISTS; TIME DOMAIN ANALYSIS;

EXPOSURE THRESHOLD; NON-ADIABATIC; NON-ADIABATIC PROCESS; OPTICAL FIELD INTENSITY; OPTICAL NEAR FIELD; PHOTOCHEMICAL PROCESS; SIMULATED RESULTS; SPATIAL GRADIENTS;

FINITE DIFFERENCE TIME DOMAIN METHOD;

EID: 63749100402     PISSN: None     EISSN: 19342608     Source Type: Journal    
DOI: 10.1117/1.2833587     Document Type: Article

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