Near-field optical chemical vapor deposition using Zn(acac)2 with a non-adiabatic photochemical process

Applied Physics B: Lasers and Optics

Volumn 84, Issue 1-2, 2006, Pages 247-251

  Kawazoe, T ^a   Kobayashi, K ^b   Ohtsu, M ^a,c  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOCHEMICAL REACTIONS; PHOTODISSOCIATION; VISIBILITY; ZINC;

EXCITON-PHONON POLARITON MODEL; NEAR-FIELD OPTICAL CHEMICAL VAPOR DEPOSITION (NFO-CVD); STEEP SPATIAL GRADIENT;

CHEMICAL VAPOR DEPOSITION;

EID: 33745684342     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-006-2224-z     Document Type: Article

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