Nonadiabatic photochemical reaction and application to photolithography

Journal of Luminescence

Volumn 122-123, Issue 1-2, 2007, Pages 230-233

  Yonemitsu, Hiroki ^a   Kawazoe, Tadashi ^b   Kobayashi, Kiyoshi ^c   Ohtsu, Motoichi ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Nanofabrication.; Nanophotolithography; Nonadiabatic photochemical reaction; Photolithography

Indexed keywords

EXCITONS; MATHEMATICAL MODELS; MOIRE FRINGES; NANOTECHNOLOGY; PHONONS; PHOTOLITHOGRAPHY;

EXCITON PHONON POLARITON MODEL; FRANCK CONDON PRINCIPLE; NANOPHOTOLITHOGRAPHY; NONADIABATIC PHOTOCHEMICAL REACTION;

PHOTOCHEMICAL REACTIONS;

EID: 33750936225     PISSN: 00222313     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jlumin.2006.01.115     Document Type: Article

References (6)

1. Kawazoe T., et al. Appl. Phys. Lett. 79 (2001) 1184
2. Kawazoe T., et al. J. Chem. Phys 122 (2005) 024715
3. Kawazoe T., and Ohtsu M. Proc. SPIE. 5339 (2004) 619
4. Chou S.Y., Krauss P.R., and Renstrom P.J. Appl. Phys. Lett. 67 (1995) 3114
5. Alkaisi M.M., Blaikie R.J., McNab S.J., Cheung R., and Cumming D.R.S. Appl. Phys. Lett. 75 (1999) 3560
6. Rogers J.A., et al. Appl. Phys. Lett. 70 (1997) 2658