Nanometric patterning of zinc by optical near-field photochemical vapour deposition

Journal of Microscopy

Volumn 194, Issue 2-3, 1999, Pages 545-551

  Polonski, V V ^a   Yamamoto, Y ^a   Kourogi, M ^a,b,c   Fukuda, H ^a,b,d   Ohtsu, M ^a,b,c  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^d R and D Center   (Japan)

Author keywords

Nanoelectronic devices; Nanofabrication; Near field optics; Patterned prenucleation; Photochemical vapour deposition

Indexed keywords

NANOTECHNOLOGY;

MASK LESS; NANOELECTRONIC DEVICES; NANOMETRICS; NEAR FIELD OPTICS; OPTICAL NEAR FIELD; PATTERNED PRENUCLEATION; PHOTOCHEMICAL VAPOR DEPOSITION; PHOTOCHEMICALS; PRE-NUCLEATION; VAPOUR DEPOSITION;

ZINC;

ZINC;

CONFERENCE PAPER; IMAGE ANALYSIS; MICROSCOPY; OPTICS; PHOTOCHEMISTRY; PRIORITY JOURNAL; SCANNING NEAR FIELD OPTICAL MICROSCOPY; ULTRAVIOLET RADIATION; VAPOR;

EID: 0033059843     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1046/j.1365-2818.1999.00497.x     Document Type: Conference Paper

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