Current path analysis of the direct contact between ITO and Al-Ni alloy films

Journal of the Electrochemical Society

Volumn 156, Issue 5, 2009, Pages

  Kugimiya, Toshihiro ^a   Goto, Hiroshi ^b   Kawakami, Nobuyuki ^b   Nakai, Junichi ^b   Yoneda, Yoichiro ^a   Kusumoto, Eisuke ^a  

^a KOBELCO RESEARCH INSTITUTE INC   (Japan)

^b KOBE STEEL LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; AMORPHOUS SILICON; CHROMIUM; ELECTRIC CONTACTS; INDIUM; LIQUID CRYSTAL DISPLAYS; METAL CLADDING; MOLYBDENUM; NICKEL; REGRESSION ANALYSIS; SILICON ALLOYS; SILICON NITRIDE; STRIPPING (DYES); THIN FILM TRANSISTORS; TIN; TITANIUM COMPOUNDS;

AL-NI ALLOYS; AMORPHOUS SILICON THIN-FILM TRANSISTORS; BARRIER METALS; CONTACT HOLES; CURRENT PATHS; DIRECT CONTACTS; ELECTRICAL CONTACTS; INDIUM-TIN OXIDES; ITO FILMS; LOW RESISTIVITIES; PHOTORESIST STRIPPING; SINGLE LAYERS;

ALUMINUM;

EID: 63649158279     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3097196     Document Type: Article

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