Current status and prospect of extreme ultraviolet lithography

Journal of Photopolymer Science and Technology

Volumn 21, Issue 6, 2008, Pages 777-784

  Watanabe, Takeo ^a   Kinoshita, Hiroo ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Exposure tool; Extreme ultraviolet lithography; Line width roughness; Mask; Resist; Sensitivity; Source

Indexed keywords

EID: 63649119345     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.777     Document Type: Article

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