EUV exposure experiment using programmed multilayer defects for refining printability simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Tezuka, Yoshihiro ^a   Cullins, Jerry ^a   Tanaka, Yuusuke ^a   Hashimoto, Takeo ^a   Nishiyama, Iwao ^a   Shoki, Tsutomu ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b HOYA CORPORATION   (Japan)

Author keywords

Defect; EUV; Mask blanks; Multilayer; Phase defect; Printability; Simulation

Indexed keywords

COMPUTER SIMULATION; DEFECTS; MULTILAYERS; TRANSMISSION ELECTRON MICROSCOPY;

DEFECT PROTRUSION; MICRO EXPOSURE TOOL (MET); PRINTABILITY;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148817449     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711967     Document Type: Conference Paper

References (8)

1. C. Holfeld, K. Bubke, F. Lehmann, B. Fontaine, A. Pawloski, S. Schwarzl, F. Kamm, T. Graf, and A. Erdmann, "Defect Printability Study using EUV Lithography", Proceedings of SPIE Vol. 6151, 61510U, 2006.
2. T. Liang, G. Zhang, P. Naulleau, A. Myers, S. Park, A. Stivers and G. Vandentop, "EUV Mask Pattern Defect Printability", Proceedings of SPIE Vol. 6283, 62830K, 2004.
3. J. Cullins, Y. Tezuka, Y. Tanaka, T. Hashimoto, I. Nishiyama and T. Shoki, "EUVL mask substrate defect print study", Proceedings of SPIE Vol. 6517, 2007
4. P. Naulleau, K. Goldberg, E. Anderson, K. Bradley, R. Delano, P. Denham, B. Gunion, B. Harteneck, B. Hoef, H. Huang, K. Jackson, G. Jones, D. Kemp, J. Liddle, R. Oort, A. Rawlings, S. Rekawa, F. Salmassi, R. Tackaberry, C. Chung, L. Hale, D. Phillion, G. Sommargren, and J. Taylor, "Status of EUV microexposure capabilities at the ALS using the 0.3-NA MET optics", Proceedings of SPIE Vol. 5374, p881-891, 2004.
5. J. Cain, P. Naulleau, and C. Spanos, "Lithographic measurement of EUV flare in the 0.3-NA Micro Exposure Tool optic at the Advanced Light Source", Proceedings of SPIE Vol. 5715, p301-310, 2005.
6. P. Naulleau, C. Rammeloo, J. Cain, K. Dean, P. Denham, K. Goldberg, B. Hoef, B. Fontaine, A. Pawloski, C. Larsen, and G. Wallraff, "Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists", Proceedings of SPIE Vol. 6151, 61510Y-1, 2006.
7. S. Burger, R. Kohle, L. Zschiedrich, W. Gao, F. Schmidt, R. März, C. Nölscher, "Benchmark of FEM, waveguide, and FDTD algorithms for rigorous mask simulation", Proceedings of SPIE Vol. 5992, p378-389, 2005.
8. Y. Tezuka, M. Ito, T. Terasawa and T. Tomie, "Actinic detection of multilayer defects on EUV mask blanks using LPP light source and dark-field imaging", Proceedings of SPIE Vol. 5374, p271-280, 2004.