Diffusion mechanisms and capture radii in silicon

2002 International Conference on Computational Nanoscience and Nanotechnology - ICCN 2002

Volumn , Issue , 2002, Pages 251-254

  Beardmore, K M ^a   Windl, W ^b   Haley, B P ^c   Gronbech Jensen N ^c  

^a MOTOROLA INC   (United States)

^b OHIO STATE UNIVERSITY   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Ab initio; Diffusion; Dopant; KLMC; Silicon

Indexed keywords

ANNEALING; APPROXIMATION THEORY; BINDING ENERGY; COMPUTER SIMULATION; DEFECTS; DIFFUSION; DOPING (ADDITIVES); ION IMPLANTATION; LATTICE CONSTANTS; MATHEMATICAL MODELS; MONTE CARLO METHODS; OPTIMIZATION;

AB INITIO; DIFFUSION MODELING; DOPANT; KLMC;

SILICON;

EID: 6344249121     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)

1. M. M. Bunea, Ph.D. Thesis, Boston Univ. (2000).
2. Marius M. Bunea, Pavel Fastenko and Scott T. Dunham, Mat. Res. Soc. Proc. 568 p. 135.
3. O. Pankratov, H. Huang, T. D. de la Rubia and C. Mailhiot, Phys. Rev. B, 56, 13172 (1997).
4. J. S. Nelson, P. A. Schultz and A. F. Wright, Appl. Phys. Lett. 73, 247 (1998).
5. J. Xie and S. P. Chen, Phys. Rev. Lett 83, 1795 (1999); J. Phys. Cond. Matter 11, 7219 (1999); J. Appl. Phys. 87, 4160 (2000).
6. J. Xie and S. P. Chen, Phys. Rev. Lett 83, 1795 (1999); J. Phys. Cond. Matter 11, 7219 (1999); J. Appl. Phys. 87, 4160 (2000).
7. J. Xie and S. P. Chen, Phys. Rev. Lett 83, 1795 (1999); J. Phys. Cond. Matter 11, 7219 (1999); J. Appl. Phys. 87, 4160 (2000).
8. S.T. Dunham and C.D. Wu., JAP 78, 2362 (1995).
9. M. Hane, T. Ikezawa, K. Takeuchi, and G. H. Gilmer, Proc. IEDM 2001.
10. G. Kresse and J. Hafner, Phys. Rev. B 47, 558, (1993); ibid. 49, 14251 (1994); G. Kresse and J. Furthmüller, Comput. Mat. Sci. 6, 15 (1996); Phys. Rev. B 54, 11169 (1996). G. Kresse and J. Hafner, J. Phys.: Condens. Matt. 6, 8245 (1994).
11. G. Kresse and J. Hafner, Phys. Rev. B 47, 558, (1993); ibid. 49, 14251 (1994); G. Kresse and J. Furthmüller, Comput. Mat. Sci. 6, 15 (1996); Phys. Rev. B 54, 11169 (1996). G. Kresse and J. Hafner, J. Phys.: Condens. Matt. 6, 8245 (1994).
12. G. Kresse and J. Hafner, Phys. Rev. B 47, 558, (1993); ibid. 49, 14251 (1994); G. Kresse and J. Furthmüller, Comput. Mat. Sci. 6, 15 (1996); Phys. Rev. B 54, 11169 (1996). G. Kresse and J. Hafner, J. Phys.: Condens. Matt. 6, 8245 (1994).
13. G. Kresse and J. Hafner, Phys. Rev. B 47, 558, (1993); ibid. 49, 14251 (1994); G. Kresse and J. Furthmüller, Comput. Mat. Sci. 6, 15 (1996); Phys. Rev. B 54, 11169 (1996). G. Kresse and J. Hafner, J. Phys.: Condens. Matt. 6, 8245 (1994).
14. G. Kresse and J. Hafner, Phys. Rev. B 47, 558, (1993); ibid. 49, 14251 (1994); G. Kresse and J. Furthmüller, Comput. Mat. Sci. 6, 15 (1996); Phys. Rev. B 54, 11169 (1996). G. Kresse and J. Hafner, J. Phys.: Condens. Matt. 6, 8245 (1994).
15. M. J. Puska, S. Pöykkö, M. Pesola, and R. M. Nieminen, Phys. Rev. B 58, 1318 (1998).
16. S. M. Hu, Phys. Status Solidi B 60, 595 (1973).
17. M. Tang, L. Colombo, J. Zhu and T. Diaz de la Rubia, Phys. Rev B 55, 14279, (1997).
18. M. Jaraiz, G. H. Gilmer and J. M. Poate, Appl. Phys. Lett. 68, 409 (1996).
19. W. Windl, M. M. Bunea,R. Stumpf, S. T. Dunham, and M. P. Masquelier, Phys. Rev. Lett. 83, 4345 (1999); in Proc. MSM 1999 (Computational Publications, Cambridge, MA 1999), p. 369.
20. W. Windl, M. M. Bunea,R. Stumpf, S. T. Dunham, and M. P. Masquelier, Phys. Rev. Lett. 83, 4345 (1999); in Proc. MSM 1999 (Computational Publications, Cambridge, MA 1999), p. 369.