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Volumn 56, Issue 20, 1997, Pages 13172-13176
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As-vacancy interaction and ring mechanism of diffusion in Si
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0000353655
PISSN: 10980121
EISSN: 1550235X
Source Type: Journal
DOI: 10.1103/PhysRevB.56.13172 Document Type: Article |
Times cited : (56)
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References (12)
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