메뉴 건너뛰기




Volumn 45, Issue 7, 2009, Pages 376-377

100 nm gate AlGaN/GaN HEMTs on silicon with fT = 90GHz

Author keywords

[No Author keywords available]

Indexed keywords

CUTOFF FREQUENCY; ELECTRON MOBILITY; GALLIUM ALLOYS; GALLIUM NITRIDE; SEMICONDUCTING GALLIUM; SUBSTRATES;

EID: 63349100423     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el.2009.0074     Document Type: Article
Times cited : (37)

References (10)
  • 2
    • 42149138431 scopus 로고    scopus 로고
    • Millimeter-wave GaN HFET technology
    • ' '
    • Higashiwaki, M., Mimura, T., and Matsui, T.: ' Millimeter-wave GaN HFET technology ', Proc. SPIE, 2008, 6894, p. 68941L1-9
    • (2008) Proc. SPIE , vol.6894
    • Higashiwaki, M.1    Mimura, T.2    Matsui, T.3
  • 4
    • 59649110807 scopus 로고    scopus 로고
    • High-performance 0.1m Gate AlGaN/GaN HEMTs on silicon with low-noise figure at 20GHz
    • ' ', (), 0741-3106
    • Sun, H.F., Alt, A.R., Benedickter, H., and Bolognesi, C.R.: ' High-performance 0.1m Gate AlGaN/GaN HEMTs on silicon with low-noise figure at 20GHz ', IEEE Electron Device Lett., 2009, 30, (2), p. 107-110 0741-3106
    • (2009) IEEE Electron Device Lett. , vol.30 , Issue.2 , pp. 107-110
    • Sun, H.F.1    Alt, A.R.2    Benedickter, H.3    Bolognesi, C.R.4
  • 5
    • 63349083390 scopus 로고    scopus 로고
    • http://www.nitronex.com
    • http://www.nitronex.com
  • 6
    • 84887431954 scopus 로고    scopus 로고
    • Gallium nitride surface treatment study for FET passivation process flow applications
    • ' ', Chicago, IL, USA, April, 14-17
    • Veety, M.T., Wheeler, V.D., Morgensen, M.P., Johnson, M.A.L., and Barlage, D.W.: ' Gallium nitride surface treatment study for FET passivation process flow applications ', CS MANTECH Conf. Dig., Chicago, IL, USA, April, 14-17, 2008
    • (2008) CS MANTECH Conf. Dig.
    • Veety, M.T.1    Wheeler, V.D.2    Morgensen, M.P.3    Johnson, M.A.L.4    Barlage, D.W.5
  • 7
    • 35148856624 scopus 로고    scopus 로고
    • Short-channel effect limitations on high-frequency operation of AlGaN/GaN HEMTs for T-gate devices
    • ' ', (), 10.1109/TED.2007.904476 0018-9383
    • Jessen, G.H., Fitch, R.C., Gillespie, J.K., Via, G., Crespo, A., Langley, D., Denninghoff, D.J., Trejo, M., and Heller, E.R.: ' Short-channel effect limitations on high-frequency operation of AlGaN/GaN HEMTs for T-gate devices ', IEEE Trans. Electron Devices, 2007, 54, (10), p. 2589-2597 10.1109/TED.2007. 904476 0018-9383
    • (2007) IEEE Trans. Electron Devices , vol.54 , Issue.10 , pp. 2589-2597
    • Jessen, G.H.1    Fitch, R.C.2    Gillespie, J.K.3    Via, G.4    Crespo, A.5    Langley, D.6    Denninghoff, D.J.7    Trejo, M.8    Heller, E.R.9
  • 8
    • 63349108209 scopus 로고    scopus 로고
    • Cryogenic characteristics of sub-100-nm-gate AlGaN/GaN MIS-HEMTs
    • ' ', (), 1610-1634
    • Endoh, A., Watanabe, I., Yamashita, Y., Mimura, T., and Matsui, T.: ' Cryogenic characteristics of sub-100-nm-gate AlGaN/GaN MIS-HEMTs ', Phys. Status Solidi C, 2008, 5, (6), p. 1917-1919 1610-1634
    • (2008) Phys. Status Solidi C , vol.5 , Issue.6 , pp. 1917-1919
    • Endoh, A.1    Watanabe, I.2    Yamashita, Y.3    Mimura, T.4    Matsui, T.5
  • 10
    • 33947251311 scopus 로고    scopus 로고
    • At-bias extraction of access parasitic resistances in AlGaN/GaN HEMTs: Impact on device linearity and channel electron velocity
    • ' ', (), 10.1109/TED.2006.885663 0018-9383
    • DiSanto, D.W., and Bolognesi, C.R.: ' At-bias extraction of access parasitic resistances in AlGaN/GaN HEMTs: impact on device linearity and channel electron velocity ', IEEE Trans. Electron Devices, 2006, 53, (12), p. 2914-2919 10.1109/TED.2006.885663 0018-9383
    • (2006) IEEE Trans. Electron Devices , vol.53 , Issue.12 , pp. 2914-2919
    • Disanto, D.W.1    Bolognesi, C.R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.