Gallium nitride surface treatment study for FET passivation process flow applications

2008 International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2008

Volumn , Issue , 2008, Pages

  Veety, M T ^a   Wheeler, V D ^a   Morgensen, M P ^a   Johnson, M A L ^a   Barlage, D W ^a  

^a North Carolina State University   (United States)

Author keywords

Etch etch stops; Passivation techniques; Processing; Wide bandgap

Indexed keywords

C-PLANE SAPPHIRE SUBSTRATES; DIELECTRIC DEPOSITION; ETCH STOP; PASSIVATION PROCESS; PINCH OFF VOLTAGE; SUBTHRESHOLD SWING; SURFACE PASSIVATION; WIDE BAND GAP;

GATE DIELECTRICS; PROCESSING; SEMICONDUCTOR DEVICE MANUFACTURE;

GALLIUM NITRIDE;

EID: 84887431954     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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