Deposition and characterisation of vanadium oxide thin films: Linking single crystal and supported catalyst

Catalysis Today

Volumn 142, Issue 3-4, 2009, Pages 125-131

  Poelman, H ^a   Silversmit, G ^a   Poelman, D ^a   Marin, G B ^a   Sels, B S ^b  

^a GHENT UNIVERSITY   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Model catalysts; ODH; Sputter deposition; Thin films; Titania supported vanadia; Vanadium oxide

Indexed keywords

CATALYSIS; DEHYDROGENATION; DEPOSITION; OXIDE FILMS; PARAFFINS; POWER SUPPLY CIRCUITS; SILICA; SINGLE CRYSTALS; SPUTTER DEPOSITION; SURFACE TESTING; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES; TRANSITION METALS; VANADIUM; VANADIUM ALLOYS; VANADIUM COMPOUNDS;

CATALYTIC TESTING; CHARACTERISATION; COATED PARTICLES; CONTROLLABLE SYNTHESIS; IN-SITU; INDUSTRIAL CATALYSTS; INERT PARTICLES; MODEL CATALYSTS; ODH; OXIDATIVE DEHYDROGENATIONS; PHYSICAL VAPOUR DEPOSITIONS; PROCESS CONDITIONS; RESULTING MATERIALS; SUPPORTED CATALYSTS; SUPPORTED VANADIUM OXIDES; SURFACE CHARACTERISATION; SURFACE-SENSITIVE TECHNIQUES; SYNERGETIC INTERACTIONS; TITANIA SUPPORTED VANADIA; TITANIA SUPPORTS; VANADIA; VANADIUM OXIDE; VANADIUM OXIDE THIN FILMS; VARYING THICKNESS; WELL-DISPERSED; XPS;

CATALYST SUPPORTS;

EID: 63349092310     PISSN: 09205861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cattod.2008.09.008     Document Type: Article

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