Structural properties of V2O5 thin films prepared by vacuum evaporation

Materials Science in Semiconductor Processing

Volumn 6, Issue 5-6, 2003, Pages 543-546

  Rajendra Kumar, R T ^a   Karunagaran, B ^a   Senthil Kumar, V ^a   Jeyachandran, Y L ^a   Mangalaraj, D ^a   Narayandass, Sa K ^a  

^a BHARATHIAR UNIVERSITY   (India)

Author keywords

Microstructural parameters; Raman scattering; Vanadium oxide thin films; X ray diffraction

Indexed keywords

CHEMICAL VAPOR DEPOSITION; EVAPORATION; GRAIN SIZE AND SHAPE; LATTICE CONSTANTS; MICROSTRUCTURE; POLYCRYSTALS; RAMAN SCATTERING; RECRYSTALLIZATION (METALLURGY); VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

VACUUM EVAPORATION; VIBRATION BANDS;

THIN FILMS;

EID: 1642602980     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2003.08.017     Document Type: Conference Paper

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