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Volumn 386, Issue 2, 2001, Pages 281-285
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Properties of V2O5 thin films deposited by means of plasma MOCVD
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Author keywords
Cyclic voltammetry; Electrochromic material; Plasma CVD; V2O5 film
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Indexed keywords
CYCLIC VOLTAMMETRY;
ELECTROCHROMISM;
ELECTROLYTES;
FUSED SILICA;
LIGHT ABSORPTION;
LIGHT TRANSMISSION;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
PLASMAS;
SUBSTRATES;
THIN FILMS;
VANADIUM COMPOUNDS;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
MICROWAVE PLASMAS;
OPTICAL FILMS;
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EID: 0035874094
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(00)01674-6 Document Type: Article |
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Times cited : (35)
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References (16)
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