A comparative study of the influence of different post-treatment methods on the properties of HfO2 single layers

Optics and Laser Technology

Volumn 41, Issue 5, 2009, Pages 570-573

  Wang, Congjuan ^a,b   Jin, Yunxia ^a   Zhang, Dongping ^c   Shao, Jianda ^a   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^c SHENZHEN UNIVERSITY   (China)

Author keywords

Heat treatment; Ion post treatment; Laser conditioning

Indexed keywords

ELECTRON BEAMS; HAFNIUM COMPOUNDS; HEAT TREATING FURNACES; HEAT TREATMENT; IONS; LASER DAMAGE; LASERS; SPUTTERING; STOICHIOMETRY;

COMPARATIVE STUDIES; ELECTRON BEAM EVAPORATIONS; FILM STOICHIOMETRIES; ION POST-TREATMENT; ION-SPUTTERING; LASER CONDITIONING; LASER-INDUCED DAMAGE THRESHOLDS; POST-TREATMENT METHODS; SINGLE LAYERS; STRESS RELEASE;

ION BOMBARDMENT;

EID: 63249097093     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2008.10.013     Document Type: Article

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