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Thin Solid Films

Volumn 396, Issue 1-2, 2001, Pages 44-52

Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films

(7) Alvisi, M a De Tomasi, F b Perrone, M R b Protopapa, M L b Rizzo, A a Sarto, F c Scaglione, S c

a Centro Nazionale per la Ricerca e lo Sviluppo dei Materiali (Italy)

b INFM (Italy)

c Enea Casaccia (Italy)

Author keywords

Laser irradiation; Oxides; Physical vapor deposition (PVD); Radiation damage

Indexed keywords

EXCIMER LASERS; HAFNIUM COMPOUNDS; LASER BEAM EFFECTS; PHYSICAL VAPOR DEPOSITION; RADIATION DAMAGE; SILICA; SUBSTRATES;

ION-ASSISTED THIN FILMS;

THIN FILMS;

EID: 0035928990 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01184-1 Document Type: Article

Times cited : (68)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.