UV laser conditioning for reduction of 351-nm damage initiation in fused silica

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4679, Issue , 2002, Pages 48-55

  Brusasco, Raymond M ^a   Penetrante, Bernie M ^a   Peterson, John E ^a   Maricle, Stephen M ^a   Menapace, Joseph A ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Damage initiation; Fused silica; Laser conditioning; UV laser surface damage

Indexed keywords

ETCHING; FUSED SILICA; LASER OPTICS; POLISHING; REDUCTION; SURFACE PHENOMENA; ULTRAVIOLET RADIATION;

LASER CONDITIONING;

LASER DAMAGE;

EID: 0036035459     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.461718     Document Type: Conference Paper

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