Comparative scatterometric CD measurements on a MoSi photo mask using different metrology tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Richter, Jan ^a   Rudolf, Jens ^a   Bodermann, Bernd ^b   Lam, John C ^c  

^a Advanced Mask Technology Center GmbH and Co KG   (Germany)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^c N and K Technology Inc   (United States)

Author keywords

At wavelength metrology; CD; Diffractometry; Edge profile; Ellipsometry; Inverse diffraction problem; Pitch; Polarisation; Reflectometry; Scatterometry

Indexed keywords

AT-WAVELENGTH METROLOGY; CD; DIFFRACTOMETRY; EDGE PROFILE; INVERSE DIFFRACTION PROBLEM; PITCH; POLARISATION; REFLECTOMETRY; SCATTEROMETRY;

DATA STORAGE EQUIPMENT; DIFFRACTOMETERS; ELECTROMAGNETIC WAVE DIFFRACTION; ELLIPSOMETRY; MECHANISMS; METEOROLOGICAL INSTRUMENTS; PHASE MEASUREMENT; PHOTOMASKS; PLASMA THEORY; POLARIZATION; PRINTING; REFLECTION; REFLECTOMETERS; TABLE LOOKUP; THREE DIMENSIONAL; UNCERTAINTY ANALYSIS;

MEASUREMENTS;

EID: 62749107691     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.800732     Document Type: Conference Paper

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