Novel technique for critical dimension measurements of phase-shift masks using broadband transmittance spectra in conjunction with RCWA

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Gray, Alexander ^a   Lam, John C ^b   Stanley, Chen ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b N and K Technology Inc   (United States)

Author keywords

Broadband reflectometry; CD linearity; Critical dimensions; Forouhi Bloomer dispersion equations; Optical metrology; RCWA; Repeatability; Transmittance measurements

Indexed keywords

BROADBAND REFLECTANCE; BROADBAND REFLECTOMETRY; CRITICAL DIMENSION (CD); DISPERSION EQUATIONS; FOROUHI BLOOMER DISPERSION EQUATIONS; PHASE SHIFT PHOTOMASKS; REPEATABILITY;

MASKS; NANOTECHNOLOGY; OPACITY; OPTICAL VARIABLES MEASUREMENT; OPTICAL WAVEGUIDES; PHASE SHIFT;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 33846611997     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.693243     Document Type: Conference Paper

References (0)