Influence of mask surface processing on CD-SEM imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Hauptmann, Marc ^a   Eng, Lukas M ^b   Richter, Jan ^a  

^a Advanced Mask Technology Center GmbH and Co KG   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CADMIUM; CADMIUM COMPOUNDS; CHARGED PARTICLES; CHROMIUM; COATING TECHNIQUES; COMPUTER NETWORKS; CRACK DETECTION; DATA STORAGE EQUIPMENT; ELECTRICITY; ELECTRON EMISSION; ELECTRON MICROSCOPES; ELECTRONS; EXPERIMENTS; IMAGING TECHNIQUES; LITHOGRAPHY; MATHEMATICAL MODELS; MEASUREMENTS; METALS; MODAL ANALYSIS; MODEL STRUCTURES; NUMERICAL ANALYSIS; PHOTOACOUSTIC EFFECT; PHOTOMASKS; PHOTORESISTS; PHYSICAL PROPERTIES; SECONDARY EMISSION; SURFACE CHARGE; SURFACE CHEMISTRY; SURFACE POTENTIAL; SURFACES; TECHNOLOGY; UNCERTAINTY ANALYSIS;

(1 1 0) SURFACE; (PL) PROPERTIES; CHARGE DECAY; CHARGING (MATERIALS); CHARGING EFFECTS; CHROMIUM STRUCTURES; CHROMIUM(III) OXIDES; CYCLE TIMES; ELECTRICAL BEHAVIORS; ELECTRON ENERGIES; IMAGING PROCESSING; MASK CLEANING; MASK MANUFACTURING; MASK TECHNOLOGY; MEASUREMENT ACCURACY; MEASUREMENT PROCESSES; MEASUREMENT UNCERTAINTIES; NEXT-GENERATION LITHOGRAPHY (NGL); NUMERICAL CALCULATIONS; OPTICAL (PET) (OPET); PHOTO MASKING; SECONDARY ELECTRON YIELDS; SEM IMAGING; SIMPLE MODELING; SURFACE ACTIVATION; SURFACE CHANGES; SURFACE PREPARATIONS; SURFACE PROCESSING;

SURFACE PROPERTIES;

EID: 45549087263     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793106     Document Type: Conference Paper

References (10)

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