Matching of different CD-metrology tools for global CD signature on photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 2, 2007, Pages

  Zerbe, E M ^a   Marschner, T ^a   Richter, J ^a   Utzny, C ^a  

^a Advanced Mask Technology Center   (Germany)

Author keywords

Critical Dimension Uniformity (CDU); Thin plate splines; Toolmatching

Indexed keywords

PARAMETER ESTIMATION; PATTERN MATCHING;

CRITICAL DIMENSION UNIFORMITY (CDU); THIN PLATE SPLINES; TOOLMATCHING;

PHOTOMASKS;

PARAMETERS;

EID: 36248959684     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728992     Document Type: Conference Paper

References (6)

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