CD-Signature evaluation evaluation using scatterometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Richter, Jan ^a   Laube, Philipp ^a   Lam, John ^b  

^a Advanced Mask Technology Center GmbH and Co KG   (Germany)

^b N and K Technology Inc   (United States)

Author keywords

Critical dimensions; Cross calibration; Metrology; Photolithographic masks; Reproducibility; Scatterometry

Indexed keywords

LIGHT SCATTERING; MICROMETERS; PARAMETER ESTIMATION; SPURIOUS SIGNAL NOISE;

CRITICAL DIMENSIONS; CROSS-CALIBRATION; PHOTOLITHOGRAPHIC MASKS; SCATTEROMETRY;

MEASUREMENT THEORY;

EID: 42149174468     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.741263     Document Type: Conference Paper

References (3)

1. Utzny, M. Rößiger, Determination of spatial CD signature on Photomasks, SPIE Microlithography Conference 2005, Proc. SPIE 6349 (2006)
2. J. Richter, R. Liebe, F. Laske, J. Rudolf, T. Heins, Measurement tool influence on CD results on photolithographic masks, SPIE Microlithography Conference 2005, Proc. SPIE 6283 (2006)
3. E.-M. Zerbe, T. Marschner, J. Richter, C. Utzny, Matching of different CD-metrology tools for global CD signature on photomasks, Proc. SPIE Vol. 6607 (2007)