Evaluation of metalorganic precursors for preparing BiFeO3 thin films by liquid delivery chemical vapor deposition

Integrated Ferroelectrics

Volumn 81, Issue 1, 2006, Pages 281-288

  Tasaki, Y ^a   Kanoko, T ^b   Kabeya, M ^b   Chifu, N ^b   Yoshizawa, S ^b  

^a Toshima MFG Co Ltd   (Japan)

^b MEISEI UNIVERSITY   (Japan)

Author keywords

Bismuth iron oxide; Liquid delivery CVD; Multiferroic material; Precursor

Indexed keywords

BISMUTH COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLARIZATION; SOLUTION MINING; SUBSTRATES;

BISMUTH IRON OXIDE; LIQUID-DELIVERY CVD; MULTIFERROIC MATERIAL; PRECURSOR;

THIN FILMS;

EID: 33745815326     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580600663706     Document Type: Article

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