-
1
-
-
33745802201
-
Illumination conditions matching for critical layers manufacturing in a production context
-
Armellin, L.-P., Torsy, A., Hernan, K., et al., "Illumination conditions matching for critical layers manufacturing in a production context" Proc. SPIE 6154, 61543 V (2006).
-
(2006)
Proc. SPIE 6154, 61543
, vol.5
-
-
Armellin, L.-P.1
Torsy, A.2
Hernan, K.3
-
2
-
-
33745775436
-
Active spectral control of DUV light sources for OPE minimization
-
Dunstan, W.J., Jacques, R., Rafac, R. J., et al., "Active spectral control of DUV light sources for OPE minimization" Proc. SPIE 6154, 51542J (2006).
-
(2006)
Proc. SPIE
, vol.6154
-
-
Dunstan, W.J.1
Jacques, R.2
Rafac, R.J.3
-
3
-
-
25144456451
-
Proximity Matching for 193 nm scanner using scatterometry
-
Zhou, W., Yu, J., Lo, J., et al., "Proximity Matching for 193 nm scanner using scatterometry" Proc. SPIE 5754, 1249-1259(2005).
-
(2005)
Proc. SPIE
, vol.5754
, pp. 1249-1259
-
-
Zhou, W.1
Yu, J.2
Lo, J.3
-
4
-
-
3843126359
-
Matching OPC and masks on 300-mm lithography tools utilizing variable illumination settings
-
Palitzsch, K., Kubis, M., Schroeder, U. P., et al., "Matching OPC and masks on 300-mm lithography tools utilizing variable illumination settings" Proc. SPIE 5377, 872-880 (2004).
-
(2004)
Proc. SPIE
, vol.5377
, pp. 872-880
-
-
Palitzsch, K.1
Kubis, M.2
Schroeder, U.P.3
-
5
-
-
45449117475
-
Tool-to-tool optical proximity effect matching
-
Van Look, L., Bekaert J., De Bisschop P., et al., "Tool-to-tool optical proximity effect matching" Proc. SPIE 6924, 6924-61 (2008).
-
(2008)
Proc. SPIE
, vol.6924
, pp. 6924-6961
-
-
Van Look, L.1
Bekaert, J.2
De Bisschop, P.3
-
6
-
-
25144434845
-
Matching multiple-feature CD response from exposure tools: Analysis of error sources with their impact in low-k1 regime
-
Finders, J., Dusa, M., "Matching multiple-feature CD response from exposure tools: analysis of error sources with their impact in low-k1 regime" Proc. SPIE 5754, 164-176 (2004).
-
(2004)
Proc. SPIE
, vol.5754
, pp. 164-176
-
-
Finders, J.1
Dusa, M.2
-
7
-
-
4344703784
-
Assessments on process parameters' influences to the proximity correction
-
Lee, E.-M., Lee, S.-W., Lee, D.-Y., et al., "Assessments on process parameters' influences to the proximity correction" Proc. SPIE 5375, 287-295 (2004).
-
(2004)
Proc. SPIE
, vol.5375
, pp. 287-295
-
-
Lee, E.-M.1
Lee, S.-W.2
Lee, D.-Y.3
-
8
-
-
33745790897
-
Laser Bandwidth and Other Sources of Focus Blur in Lithography
-
Brunner, T., Corliss, D., Butt, S., et al., "Laser Bandwidth and Other Sources of Focus Blur in Lithography" Proc. SPIE 6154, 61540V (2006).
-
(2006)
Proc. SPIE
, vol.6154
-
-
Brunner, T.1
Corliss, D.2
Butt, S.3
-
9
-
-
3843105089
-
Understanding Chromatic Aberration Impacts on Lithographic Imaging J
-
Lai, K., Lalovic, I., Fair, R., et al., "Understanding Chromatic Aberration Impacts on Lithographic Imaging" J. Microlithography Microfabrication and Microsystems 2, 105-111 (2003).
-
(2003)
Microlithography Microfabrication and Microsystems
, vol.2
, pp. 105-111
-
-
Lai, K.1
Lalovic, I.2
Fair, R.3
|