Proximity matching for 193 nm scanner using scatterometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 3, 2005, Pages 1249-1259

  Zhou, WenZhan ^a   Yu, Jin ^a   Lo, James ^a   Liu, Johnson ^a   Tjhin, Henry ^b   Dziura, Thaddeus G ^b  

^a UMC Ltd   (Singapore)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

Acid Diffusion; Defocus; OPC; Partial Coherence; Proximity Matching; Scatterometery

Indexed keywords

ACID DIFFUSION; DEFOCUS; OPC; PARTIAL COHERENCE; PROXIMITY MATCHING; SCATTEROMETRY;

COMPUTER SIMULATION; LIGHT SCATTERING; LIGHTING; PHOTORESISTS; SPECTROSCOPIC ANALYSIS; TUNING;

SCANNING;

EID: 25144456451     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601574     Document Type: Conference Paper

References (4)

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