Illumination conditions matching for critical layers manufacturing in a production context

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 III, Issue , 2006, Pages

  Armellin, Louis Pierre ^a   Torsy, Andreas ^a   Hernan, Ken ^a   Kerrien, Gurwan ^a   Guidet, Johanna ^a   Riopel, Yan ^a   Salvetat, Vincent ^b  

^a Altis Semiconductor   (France)

^b Nikon Precision Europe GmbH   (France)

Author keywords

ACLV; Illumination; Matching; OPC

Indexed keywords

ACROSS CHIP LINEWIDTH VARIATION (ACLV); EXPOSURE TOOLS; MATCHING; NESTED-ISO BIAS;

COMPUTER SIMULATION; LITHOGRAPHY; OPTICAL PROPERTIES; PATTERN MATCHING; SCANNING;

LIGHTING;

EID: 33745802201     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656538     Document Type: Conference Paper

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