Tool-to-tool optical proximity effect matching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Van Look, L ^a   Bekaert, Joost ^a   De Bisschop, Peter ^a   Van De Kerkhove, Jeroen ^a   Vandenberghe, Geert ^a   Schreel, Koen ^b   Menger, Jasper ^b   Schiffelers, Guido ^b   Knols, Edwin ^b   Willekers, Rob ^b  

^a IMEC   (Belgium)

^b ASML   (Netherlands)

Author keywords

OPC; Optical proximity correction; Optical proximity matching; Scanner matching; Scanner tuning; XT:1700i; XT:1900i

Indexed keywords

EXPOSURE METERS; LITHOGRAPHY; MATHEMATICAL MODELS; OPTICAL INSTRUMENTS; PARAMETER ESTIMATION; SCANNING; SET THEORY; SODIUM;

(E ,3E) PROCESS; EXPOSURE TOOLS; IC MANUFACTURERS; IN ORDER; NUMERICAL APERTURES (NA); OPTICAL (PET) (OPET); OPTICAL MICRO LITHOGRAPHY; OPTICAL PROXIMITY CORRECTION (OPC); OPTICAL PROXIMITY EFFECT (OPE); PARAMETER VARIATIONS; STRONG DEMAND; TOOL TO TOOL MATCHING; WORKING PROCESSES;

TOOLS;

EID: 45449117475     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772598     Document Type: Conference Paper

References (8)

1. Armellin, L.-P., Torsy, A., Hernan, K., et al., "Illumination conditions matching for critical layers manufacturing in a production context," Proc. SPIE 6154, 61543V (2006).
2. Dunstan, W.J., Jacques, R., Rafac, R. J., et al., "Active spectral control of DUV light sources for OPE minimization," Proc. SPIE 6154, 51542J (2006).
3. Zhou, W., Yu, J., Lo, J., et al., "Proximity Matching for 193 nm scanner using scatterometry," Proc. SPIE 5754, 1249-1259 (2005).
4. Palitzsch, K., Kubis, M., Schroeder, U. P., et al., "Matching OPC and masks on 300-mm lithography tools utilizing variable illumination settings," Proc. SPIE 5377, 872-880 (2004).
5. Finders, J., Dusa, M., "Matching multiple-feature CD response from exposure tools: analysis of error sources with their impact in low-k1 regime," Proc. SPIE 5754, 164-176 (2004).
6. Lee, E.-M., Lee, S.-W., Lee, D.-Y., et al., "Assessments on process parameters' influences to the proximity correction," Proc SPIE 5375, 287-295 (2004).
7. Brunner, T., Corliss, D., Butt, S., et al., "Laser Bandwidth and Other Sources of Focus Blur in Lithography," Proc. SPIE 6154, 61540V (2006).
8. Lai, K., Lalovic, I., Fair, R., et al., "Understanding Chromatic Aberration Impacts on Lithographic Imaging," J. Microlithography, Microfabrication and Microsystems 2 (2), 105-111 (2003).