Assessments on process parameters' influences to the proximity correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 287-295

  Lee, Eun Mi ^a   Lee, Sung Woo ^a   Lee, Doo Youl ^a   Choi, Soo Han ^a   Park, Joo On ^a   Jung, Sung Gon ^a   Yeo, Gi Sung ^a   Lee, Jung Hyeon ^a   Cho, Han Ku ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Grid size; OCV; OPC; Proximity

Indexed keywords

GRID SIZE; ON-CHIP VARIATION (OCV); OPTICAL PROXIMITY CORRECTION (OPC); PROXIMITY;

DATA STORAGE EQUIPMENT; DISTANCE MEASUREMENT; MICROPROCESSOR CHIPS; MONTE CARLO METHODS; MOTION COMPENSATION; PHOTOLITHOGRAPHY; SCANNING; SEMICONDUCTOR DEVICES;

PROCESS CONTROL;

EID: 4344703784     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536341     Document Type: Conference Paper

References (4)

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