Oxygen incorporation and charge donor activation via subplantation during growth of indium tin oxide films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 2, 2009, Pages 362-366

  Amassian, A ^a,b   Dudek, M ^a,c   Zabeida, O ^a   Gujrathi, S C ^a   Klemberg Sapieha, J E ^a   Martinu, L ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^b School of Operations Research and Industrial Engineering   (United States)

^c LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

INDIUM; ION BOMBARDMENT; IONS; MAGNETRONS; OXYGEN; PHOTOLITHOGRAPHY; PLASMAS; TIN; TITANIUM COMPOUNDS;

CHARGE DONORS; ELASTIC RECOIL DETECTIONS; FREE-CARRIER DENSITIES; GROWTH SURFACES; INDIUM TIN OXIDE FILMS; INDIUM TIN OXIDES; ITO FILMS; LOW-PRESSURE PLASMAS; MONTE CARLO; OPTO-ELECTRONIC PROPERTIES; OXYGEN INCORPORATIONS; OXYGEN IONS; PRIMARY PATHWAYS; RADIO FREQUENCY PLASMAS; REACTIVE MAGNETRON SPUTTERING; SUBPLANTATION; SUBSTOICHIOMETRIC OXIDES; SUBSTRATE SURFACES; TIME OF FLIGHTS;

OXIDE FILMS;

EID: 61449101657     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3081970     Document Type: Article

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