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Journal of Photopolymer Science and Technology

Volumn 15, Issue 4, 2002, Pages 603-611

New strategies for high resolution photoresists

(8) Ober, Christopher K a Douki, Katsuji a Vohra, Vaishali R a Kwark, Young Je a Liu, Xiang Qian a Conley, Will b Miller, Daniel b Zimmerman, Paul b

a Department of Obstetrics Gynecology (United States)

b International SEMATECH (United States)

Author keywords

157 nm lithography; Hexafluoroisopropyl alcohol; Tetrafluorophenol; Trifluorovinyl compound

Indexed keywords

2 METHYL 2 ADAMANTYLTRIFLUOROACRYLATE; 2 [4 (2 HYDROXYHEXAFLUOROISOPROPYL)CYCLOHEXANE]HEXAFLUOROISOPROPYLACRYLATE; ACRYLIC ACID DERIVATIVE; POLYMER; UNCLASSIFIED DRUG;

ACIDITY; ARTICLE; DENSITY; IMAGING; MATERIALS; MATERIALS TESTING; PHOTOCHEMISTRY; POLYMERIZATION; SOLUBILITY; SYNTHESIS;

EID: 0036362377 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.15.603 Document Type: Article

Times cited : (35)

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