Reversible surface morphology in shape-memory alloy thin films

Journal of Applied Physics

Volumn 105, Issue 3, 2009, Pages

  Wu, M J ^a   Huang, W M ^a   Fu, Y Q ^b   Chollet, F ^a   Hu, Y Y ^a   Cai, M ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b HERIOT WATT UNIVERSITY   (United Kingdom)

^c UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MORPHOLOGY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SOLIDS; SURFACE PROPERTIES; SURFACE TENSION; THIN FILMS;

AMBIENT TEMPERATURES; CRYSTALLINE STRUCTURES; HIGH TEMPERATURES; IRREGULAR SURFACES; MICRON-SCALE; ROOM TEMPERATURES; SHAPE MEMORIES; SHAPE-MEMORY ALLOYS; SURFACE RELIEFS;

SURFACE MORPHOLOGY;

EID: 60449117933     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3075773     Document Type: Article

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