SiO2-like film deposition by dielectric barrier discharge plasma gun at ambient temperature under an atmospheric pressure

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 6, 2006, Pages 2082-2086

  Chen, Qiang ^a   Zhang, Yuefei ^a   Han, Erli ^a   Ge, Yuanjing ^a  

^a BEIJING INSTITUTE OF GRAPHIC COMMUNICATION   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; DIELECTRIC PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA GUNS; SILICA; STAINLESS STEEL; TEMPERATURE MEASUREMENT;

CRITICAL TEMPERATURE; HEXAMETHYLDISILOXANE (HMDSO); HIGH INCIDENT PLASMA POWER; HMDSO MONOMERS;

THIN FILMS;

EID: 33750930678     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2348724     Document Type: Article

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