Effect of negative bias voltage on the microstructures of AIN thin films fabricated by reactive r.f. magnetron sputtering

Journal of Materials Science: Materials in Electronics

Volumn 8, Issue 6, 1997, Pages 385-390

  Lee, Hwan Chul ^a   Lee, Jai Young ^b  

^a Daejin University   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CRYSTAL MICROSTRUCTURE; ENERGY TRANSFER; GRAIN SIZE AND SHAPE; IONS; MAGNETRON SPUTTERING; MECHANICAL VARIABLES MEASUREMENT; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SILICON WAFERS; STRESSES; X RAY DIFFRACTION;

COMPRESSIVE STRESS; KINETIC ENERGY TRANSFER; NEGATIVE BIAS VOLTAGE; PLASMA ANALYSIS; REACTIVE RADIO FREQUENCY MAGNETRON SPUTTERING; STRESS MEASUREMENT;

THIN FILMS;

EID: 0031337388     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1018551726015     Document Type: Article

References (22)

1. T. SHIOSAKI, T. YAMAMOTO, T. ODA and A. KAWABATA, Appl. Phys. Lett. 36 (1980) 643.
2. S. YOSHIDA, S. MISAWA, Y. FUJII, S. TAKADA, H. HAYAKAWA, S. GONDA and A. ITOH, J. Vac. Sci. Technol. 16 (1979) 990.
3. Y. SOMENO, M. SASAKI and T. HIRAI, Jpn. J. Appl. Phys. 30 (1991) 790.
4. M. MORITA, N. UESUGI, S. ISOGAI, K. TSUBOUCHI and N. MIKOSHIBA, ibid. Jpn. J. Appl. Phys. 20 (1981) 17.
5. J. H. EDGAR, Z. J. YU and B. S. SYWE, Thin Solid Films 204 (1991) 115.
6. A. J. SHUSKUS, T. M. REEDER and E. L. PARADIS, Appl. Phys. Lett. 24 (1974) 155.
7. F. TAKEDA, T. MORI and T. TAKAHASHI, Jpn. J. Appl. Phys. 20 (1981) L169.
8. K. TOMINGA, S. IWAMURA, Y. SHINTANI and O. TADA, ibid. Jpn. J. Appl. Phys. 22 (1983) 418.
9. G. L. HUFFMAN, D. E. FAHNLINE, R. MESSIER and L. J. PILIONE, J. Vac. Sci. Technol. A 7 (1989) 2252.
10. H. OKANO, Y. TAKAHASHI, T. TANAKA, K. SHIBATA and S. NAKANO, Jpn. J. Appl. Phys. 31 (1992) 3446.
11. H.-C. LEE and J.-Y. LEE, J. Mater. Sci. Mater. Electron. 5 (1994) 221.
12. H.-C. LEE, G.-H. KIM, S.-K. HONG, K.-Y. LEE, Y.-J. YONG, C.-H. CHUN and J.-Y. LEE, Thin Solid Films 261 (1995) 148.
13. I. PETROV, L. HULTMAN, U. HELMERSSON, J.-E. SUNDGREN and J. E. GREENE, ibid. Thin Solid Films 169 (1989) 299.
14. J.-E. SUNDGREN, B.-O. JOHANSSON, H. T. G. HENTZELL and S.-E. KARLSSON, ibid. Thin Solid Films 105 (1983) 385.
15. I. PETROV, L. HULTMAN, J.-E. SUNDGREN and J. R. GREENE, J. Vac. Sci. Technol. A 10 (1992) 265.
16. R. GLANG, R. A . HOLMWOOD and R. L. ROSENFELD, Rev. Sci. Instrum. 36 (1965) 7.
17. Joint Committee on Powder Diffraction Standards, "Powder Diffraction File", (International Center for Powder Diffraction Data, Swarthmore, PA, 1984) Card No. 25-1123.
18. J. H. EDGAR, J. Mater. Res. 1 (1992) 235.
19. Y.-M. CHIANG, D. P. BIRNIE III and W. D. KINGERY, in "Physical Ceramics", (John Wiley & Sons, Inc., 1977) p. 31.
20. A. R. STRIGANOV and N. S. SVENTISKII, in "Tables of spectral lines of neutral and ionized atoms" (IFI/Plenum, New York-Washington, 1968).
21. J. R. SIETTMANN and C. R. AITA, J. Vac. Sci. Technol. A 6 (1988) 1712.
22. J. A. KOVACICH, J. KASPERKIEWICZ, D. LICHTMAN and C. R. AITA, J. Appl. Phys. 55 (1984) 2935.