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Volumn 94, Issue 4, 2009, Pages 905-910

Rapid-thermal-anneal-based internal gettering for germanium-doped Czochralski silicon

Author keywords

[No Author keywords available]

Indexed keywords

CLARIFICATION; COOLING; DOPING (ADDITIVES); GERMANIUM; NONMETALS; NUCLEATION; OXYGEN; PRECIPITATION (CHEMICAL); RAPID THERMAL PROCESSING; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; VACANCIES;

EID: 59649130492     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-008-4847-x     Document Type: Article
Times cited : (8)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.