Spatial variations in oxygen precipitation in silicon after high temperature rapid thermal annealing

Applied Physics Letters

Volumn 70, Issue 12, 1997, Pages 1572-1574

  Pagani, M ^a   Falster, R J ^a   Fisher, G R ^a   Ferrero, G C ^a   Olmo, M ^a  

^a MEMC Electronic Materials   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010690043     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118620     Document Type: Article

References (19)

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